C3F8-台灣黃頁B2B產品網

更新時間：Mon Apr 21 01:00:19 CST 2025

產品內容

HALOCARBON 218 (C3F8)
Perfluoropropane / Octafluoropropane

Application

Halocarbon 218 is used for a chamber cleaning gas for semiconductor industry. C3F8 is used for the replacement of conventional chamber cleaning gas such as C2F6. The product was developed and commercialized in semi application by 3M.

Production Specification

Purity: 99.99%
Air < 80 ppmv
Other Organics < 10 ppmv
Acidity < 0.1 ppmv
H2O < 1 ppmw
Non-Volatile Residue <1 ppmw

Package
Cylinder
8L ~ 50L Steel Seamless Cylinder
1000L Steel Cylinder
Valve
Standard CGA valve
DISS valve
益生菌