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產品內容
HALOCARBON 218 (C3F8)
Perfluoropropane / Octafluoropropane
Application
Halocarbon 218 is used for a chamber cleaning gas for semiconductor industry. C3F8 is used for the replacement of conventional chamber cleaning gas such as C2F6. The product was developed and commercialized in semi application by 3M.
Production Specification
Purity: 99.99%
Air < 80 ppmv
Other Organics < 10 ppmv
Acidity < 0.1 ppmv
H2O < 1 ppmw
Non-Volatile Residue <1 ppmw
Package
Cylinder
8L ~ 50L Steel Seamless Cylinder
1000L Steel Cylinder
Valve
Standard CGA valve
DISS valve
清洗水塔
Perfluoropropane / Octafluoropropane
Application
Halocarbon 218 is used for a chamber cleaning gas for semiconductor industry. C3F8 is used for the replacement of conventional chamber cleaning gas such as C2F6. The product was developed and commercialized in semi application by 3M.
Production Specification
Purity: 99.99%
Air < 80 ppmv
Other Organics < 10 ppmv
Acidity < 0.1 ppmv
H2O < 1 ppmw
Non-Volatile Residue <1 ppmw
Package
Cylinder
8L ~ 50L Steel Seamless Cylinder
1000L Steel Cylinder
Valve
Standard CGA valve
DISS valve
清洗水塔
公司資訊
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