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產品內容
Halocarbon 14 / Trifluoromethane
Application
Halocarbon 14 is combined with oxygen to etch polysilicon, silicon dioxide, silicon nitride, some metals and metal silicides. It can be combined with Halocarbon 116 (C2F6) or used alone to clean wafers and chambers.
Product Specification
Purity 99.999%
N2 5
O2 1
CO2 0.5
CO 0.5
H2O 1
SF6 1
OHC 1
HF 0.1
*Unit: ppm
公司資訊
- 統一編號28877776
- 聯絡人陳先生
- 更多元佳宇有限公司資訊
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https://www.seoweb66.com/web/QA?postID=1052357SMC 氣壓缸CM2C25-75Z
SMC 不鏽鋼氣壓缸 CM2C20-75Z 使用壓力0.06-0.7Mpa