Halocarbon 14 / Trifluoromethane Application Halocarbon 14 is combined with oxygen to etch polysilicon, silicon dioxide, silicon nitride, some metals and metal silicides. It can be combined with Halocarbon 116 (C2F6) or used alone to clean wafers and chambers. Product Specification Purity 99.999% N2 5 O2 1 CO2 0.5 CO 0.5 H2O 1 SF6 1 OHC 1 HF 0.1 *Unit: ppm
使用台灣黃頁「智慧媒合」，一次發布需求，30分鐘內獲得多家報價。
