CHF3

Halocarbon 14 / Trifluoromethane

Application
Halocarbon 14 is combined with oxygen to etch polysilicon, silicon dioxide, silicon nitride, some metals and metal silicides. It can be combined with Halocarbon 116 (C2F6) or used alone to clean wafers and chambers.



Product Specification
Purity     99.999%
N2               5
O2               1
CO2            0.5
CO              0.5
H2O             1
SF6             1
OHC            1
HF               0.1
*Unit: ppm