PECVD System

Description: AST Aegis PECVD System provides the complete product line covering the production scale from volume production, pilot production to RD platform for Dielectric and Si-based film deposition. Aegis PECVD System has served Industry Applications of worldwide customers from LED, LD, Solar Cell, Power Semiconductor, Compound Semiconductor, MEMS, Advanced Packaging, EMI Device, and AR Coatings. 1) Hard Mask (SiO2) 2) Passivation (SiO2, Si3N4) 3) SiC 4) Dimond-like Coating (DLC) 5) PIN of Thin Film PV 6) Micro-Crystalline Silicon 7) Anti-Reflection (AR) Coating Features: Aegis series has system configuration of Plasma Enhanced and HDP High Density Plasma Source for CVD, suitable for wide temperature range and low film stress deposition requirement of different customer application. Specification: Standard Chamber Batch System and Multi-Chamber Cluster Platform Available. Please contact AST for your application. Safety Approval: TUV Country of Origin: Taiwan Main Export Markets: Worldwide異型水準儀